Thickness-modulated optical dielectric constants and band alignments of HfOx Ny gate dielectrics
- G. He
- , L. D. Zhang
- , M. Liu
- , J. P. Zhang
- , X. J. Wang
- , C. M. Zhen
- CAS - Institute of Solid State Physics
- Hebei Advanced Thin Films Laboratory
Research output: Contribution to journal › Article › peer-review
18
Scopus
citations